Chemical and physical sputtering effects on the surface morphology of carbon films grown by plasma chemical vapor deposition

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Publication year
2009
Author(s)
Vazquez, L.
Buijnsters, J.G.
Number of pages
8 p.
Source
Journal of Applied Physics, 106, 3, (2009), pp. 033504
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Publication type
Article / Letter to editor
Please use this identifier to cite or link to this item: https://hdl.handle.net/2066/75298   https://hdl.handle.net/2066/75298
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