In-situ X-ray diffraction annealing study of electroplated and sputtered Cu-In-Ga precursors for application to sequential Cu(In,Ga)Se-2 processes

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Publication year
2022
Author(s)
Aninat, R.
Hovestad, A.
Zelst, F.H.M. van
Bruele, F. J. van den
Schermer, J.J.
Emmelkamp, J.
Vlieg, E.
Linden, H.
Theelen, M.
Source
Thin Solid Films, 758, (2022), pp. 1-10, article 139399
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Publication type
Article / Letter to editor
If a DOI or any other persistent identifier is unavailable, please use the following repository identifier to link to this item: https://hdl.handle.net/2066/282600   https://hdl.handle.net/2066/282600
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