Influence of discharge power level on the properties of hydroxyapatite-films deposited on Ti6AI4V with RF magnetron sputtering.

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Title:	Influence of discharge power level on the properties of hydroxyapatite-films deposited on Ti6AI4V with RF magnetron sputtering.
Author(s):	Dijk, K. van ; Schaeken, H.G.; Wolke, J.G.C. ; Marée, C.H.M.; Habraken, F.H.P.M.; Verhoeven, J.S.; Jansen, J.A.
Publication year:	1995
Source:	Journal of Biomedical Materials Research, vol. 29, (1995), pp. 269-276
ISSN:	0021-9304
DOI:	http://dx.doi.org/10.1002/jbm.820290218
Publication type:	Article / Letter to editor
Please use this identifier to cite or link to this item : http://hdl.handle.net/2066/162366
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Subject:	Development of a magnetron sputterproces for the preparation of ceramic coatings on implant materials Onderzoek naar de toepasbaarheid van een magnetron sputter-proces voor de vervaardiging van keramische deklagen op implantatiematerialen
Organization:	Oral Function and Prosthetic Dentistry Periodontology and Biomaterials
Journal title:	Journal of Biomedical Materials Research
Volume:	vol. 29
Page start:	p. 269
Page end:	p. 276