Diffusion-modified boride interlayers for chemical vapour deposition of low-residual-stress diamond films on steel substrates

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Publication year
2003Source
Thin Solid Films, 426, 1-2, (2003), pp. 85-93ISSN
Publication type
Article / Letter to editor

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Organization
Applied Molecular Physics
Solid State Chemistry
Applied Materials Science
Journal title
Thin Solid Films
Volume
vol. 426
Issue
iss. 1-2
Page start
p. 85
Page end
p. 93
Subject
Applied Molecular PhysicsThis item appears in the following Collection(s)
- Academic publications [204994]
- Electronic publications [103242]
- Faculty of Science [32345]
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