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Title: Diffusion-modified boride interlayers for chemical vapour deposition of low-residual-stress diamond films on steel substrates
Author(s): Buijnsters, J.G. ; Shankar, P.; Gopalakrishnan, P.; Enckevort, W.J.P. van ; Schermer, J.J. ; Ramakrishnan, S.S.; Meulen, J.J. ter
Publication year: 2003
Source: Thin Solid Films, vol. 426, iss. 1-2, (2003), pp. 85-93
ISSN: 0040-6090
DOI: http://dx.doi.org/10.1016/S0040-6090(03)00013-0
Publication type: Article / Letter to editor

Please use this identifier to cite or link to this item : https://hdl.handle.net/2066/112607   https://hdl.handle.net/2066/112607

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Subject: Applied Molecular Physics
Organization: Applied Molecular Physics
Solid State Chemistry
Applied Materials Science
Journal title:
Thin Solid Films
Volume: vol. 426
Issue: iss. 1-2
Page start: p. 85
Page end: p. 93

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