Etching AlAs with HF for epitaxial lift-off applications

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Title:	Etching AlAs with HF for epitaxial lift-off applications
Author(s):	Voncken, M.M.J.; Schermer, J.J. ; Niftrik, A.T.J. van ; Bauhuis, G.J. ; Mulder, P.; Larsen, P.K. ; Peters, T.P.J. ; Bruin, B. de ; Klaassen, A. ; Kelly, J.J.
Publication year:	2004
Source:	Journal of the Electrochemical Society, vol. 151, (2004), pp. G347-G352
ISSN:	0013-4651
DOI:	http://dx.doi.org/10.1149/1.1690293
Publication type:	Article / Letter to editor
Please use this identifier to cite or link to this item : http://hdl.handle.net/2066/112601
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Subject:	Applied Materials Science Molecular Materials
Organization:	Applied Materials Science Molecular Materials Nuclear Medicine
Journal title:	Journal of the Electrochemical Society
Volume:	vol. 151
Page start:	p. G347
Page end:	p. G352