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Full TextIssue DateTitleAuthor(s)
2010Properties and preparation of high quality, free-standing GaN substrates and study of spontaneous separation mechanismAshraf, H.; Kudrawiec, R.; Weyher, J.L.; Serafinczuk, J.; Misiewicz, J.; Hageman, P.R.
2010Enhanced growth rates and reduced parasitic deposition by the substitution of Cl2 for HCl in GaN HVPEBohnen, T.; Ashraf, H.; Dreumel, G.W.G. van; Weyher, J.L.; Hageman, P.R.; Vlieg, E.; Verhagen, Sjoerd
2010The nucleation of HCl and Cl2-based HVPE GaN on mis-oriented sapphire substratesBohnen, T.; Dreumel, G.W.G. van; Weyher, J.L.; Enckevort, W.J.P. van; Ashraf, H.; Jong, A.E.F. de; Hageman, P.R.; Vlieg, E.
2010The nucleation of HCl and Cl<sub>2</sub>-based HVPE GaN on mis-oriented sapphire substratesBohnen, T.; Dreumel, G.W.G. van; Weyher, J.L.; Enckevort, W.J.P. van; Ashraf, H.; Jong, A.E.F. de; Hageman, P.R.; Vlieg, E.
2009Reduction of dislocation density in epitaxial gan layers bij overgrowth of defect-related etch pitsWeyher, J.L.; Ashraf, H.; Hageman, P.R.
2008Photoelectrochemistry and Etching of SiC: a Comparison with SiKelly, J.J.; Dorp, D.H. van; Weyher, J.L.
2008Thick GaN layers grown by HVPE: Influence of the templatesAshraf, H.; Weyher, J.L.; Dreumel, G.W.G. van; Gzregorzyck, A.; Hageman, P.R.
2008Influence of sapphire annealing in trimethylaluminum atmosphere on GaN epitaxy by MOCVDGrzegorczyk, A.P.; Weyher, J.L.; Hageman, P.R.; Larsen, P.K.
2007Defect-selective etching of semiconductorsWeyher, J.L.; Kelly, J.J.; Doering, Robert; Nishi, Yoshio
2007L’erosion nanoscopiqueMontgomery, P.C.; Weyher, J.L.; Gex, Jean-Pierre
2007The influence of free-carrier concentration on the PEC etching of GaN: a calibration with Raman spectroscopyLewandowska, R.; Weyher, J.L.; Kelly, J.J.; Konczewicz, L.; Lucznik, B.
2007Orthodox etching of HVPE-grown GaNWeyher, J.L.; Lazar, S.; Macht, L.; Liliental-Weber, Z.; Molnar, R.J.; Müller, S.; Sivel, V.G.M.; Nowak, G.; Grzegory, I.
2007Anodic etching of SiC in alkaline solutionsDorp, D.H. van; Weyher, J.L.; Kelly, J.J.; Micromech, J.
2007Defect formation in GaN grown on vicinal 4H-SiC (0001) substratesRudzinski, M.; Jezierska, E.; Weyher, J.L.; Macht, L.; Hageman, P.R.; Borysiuk, J.; Rodle, T.C.; Jos, H.F.F.
2006Etching, Raman and PL study of thick HVPE-grown GaNWeyher, J.L.; Lewandowska, R.; Macht, L.J.; Lucznik, B.; Grzegory, I.
2006Characterization of wide-band-gap semiconductors (GaN, SiC) by defect-selective etching and complementary methodsWeyher, J.L.
2006Selective etching of dislocations in violet-laser diode structuresKamler, G.; Smalc, J.; Wozniak, M.; Weyher, J.L.; Czernecki, R.; Targowski, G.; Leszczynski, M.; Grzegory, I.; Porowski, S.
2005An electrochemical study of photoetching of heteroepitaxial GaN: kinetics and morphologyMacht, L.J.; Kelly, J.J.; Weyher, J.L.; Grzegorczyk, A.P.; Larsen, P.K.
2005Electrochemistry and etching of wide bandgap chemically resistant semiconductorsKelly, J.J.; Macht, L.J.; Dorp, D.H. van; Kooijman, M.R.; Weyher, J.L.
2005Statistical photoluminescence of dislocations and associated defects in heteroepitaxial GaN grown by metal organic chemical vapor depositionMacht, L.J.; Weyher, J.L.; Grzegorczyk, A.P.; Larsen, P.K.
2005Influence of sapphire annealing in trimethylgallium atmosphere on GaN epitaxy by MOCVDGrzegorczyk, A.P.; Hageman, P.R.; Weyher, J.L.; Larsen, P.K.
2005Defects in GaN single crystals and homoepitaxial structuresWeyher, J.L.; Kamler, G.; Nowak, G.; Borysiuk, J.; Lucznik, B.; Krysko, M.; Grzegory, I.; Porowski, S.
2005Defect-selective etching of SiCWeyher, J.L.; Lazar, S.; Borysiuk, J.; Pernot, J.
2005Selective etching and TEM study of inversion domains in Mg-doped GaN epitaxial layersKamler, G.; Borysiuk, J.; Weyher, J.L.; Czernecki, R.; Leszczynski, M.; Grzegory, I.; Porowski, S.
2005Growth of AlN, GaN and InN from the solutionKrukowski, S.; Grzegory, I.; Bockowski, M.; Lucznik, B.; Suski, T.; Nowak, G.; Borysiuk, J.; Wroblewski, M.; Leszczynski, M.; Perlin, P.; Porowski, S.; Weyher, J.L.
2005Influence of the nucleation layer morphology and epilayer structure on the resistivity of GaN films grown on c-plane sapphire by MOCVDGrzegorczyk, A.P.; Macht, L.J.; Hageman, P.R.; Weyher, J.L.; Larsen, P.K.
2005Revealing of defects in CdTe crystals by DSL etchingBissoli, F.; Weyher, J.L.; Zappettini, A.; Zha, M.; Zanotti, L.
2004Defects in wide band-gap semiconductors: selective etching and calibration by complementary methodsWeyher, J.L.; Macht, L.J.
2004Low dislocation density, high power InGaN laser diodesPerlin, P.; Leszczynski, M.; Prystawko, P.; Wisniewski, P.; Czernetzki, R.; Skierbiszewski, C.; Nowak, G.; Purgal, W.; Weyher, J.L.; Kamler, G.; Borysiuk, J.; Krysko, M.; Sarzynski, M.; Suski, T.; Litwin-Staszewska, E.; Dmowski, L.; Franssen, G.M.; Grzanka, S.; Swietlik, T.; Grzegory, I.; Bockowski, M.; Lucznik, B.; Porowski, S.; Gorczyca, L.; Bering, A.; Krupczynski, W.; Makarowa, I.; Wisniewska, R.; Libura, A.
2004TEM observation of nanopipes in heteroepitaxial GaNJezierska, E.; Weyher, J.L.; Rudzinski, M.; Borysiuk, J.
2004Application of orthodox defect-selective etching for studying GaN single crystals, epitaxial layers and device structuresKamler, G.; Borysiuk, J.; Weyher, J.L.; Presz, A.; Wozniak, M.; Grzegory, I.
2004Nanopipes in GaN: photo-etching and TEM studyLazar, S.; Weyher, J.L.; Macht, L.J.; Tichelaar, F.D.; Zandbergen, H.W.

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