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| Full Text | Issue Date | Title | Author(s) | | 2008 | Influence of sapphire annealing in trimethylaluminum atmosphere on GaN epitaxy by MOCVD | Grzegorczyk, A.P.; Weyher, J.L.; Hageman, P.R.; Larsen, P.K. |
| 2006 | Method for HVPE growth of thick crack-free GaN layers | Dam, C.E.C.; Grzegorczyk, A.P.; Hageman, P.R.; Larsen, P.K. |
| 2006 | GaN grown on sapphire by MOCVD : material for HEMT structures | Grzegorczyk, Andrzej Pawel |
| 2005 | An electrochemical study of photoetching of heteroepitaxial GaN: kinetics and morphology | Macht, L.J.; Kelly, J.J.; Weyher, J.L.; Grzegorczyk, A.P.; Larsen, P.K. |
| 2005 | Optical study of AlGaN/GaN based HEMT structures grown on sapphire and SiC | Ochalski, T.J.; Grzegorczyk, A.P.; Rudzinski, M.; Larsen, P.K.; Holtz, P.O.; Bergman, P.; Paskov, P.P. |
| 2005 | Statistical photoluminescence of dislocations and associated defects in heteroepitaxial GaN grown by metal organic chemical vapor deposition | Macht, L.J.; Weyher, J.L.; Grzegorczyk, A.P.; Larsen, P.K. |
| 2005 | Resistivity control of unintentionally doped GaN films | Grzegorczyk, A.P.; Macht, L.J.; Hageman, P.R.; Rudzinski, M.; Larsen, P.K. |
| 2005 | Influence of sapphire annealing in trimethylgallium atmosphere on GaN epitaxy by MOCVD | Grzegorczyk, A.P.; Hageman, P.R.; Weyher, J.L.; Larsen, P.K. |
| 2005 | Influence of the misorientation of 4H-SiC substrates on the morphology and crack formation in hetero epitaxial MOCVD grown GaN epilayers by MOCVD | Rudzinski, M.; Hageman, P.R.; Grzegorczyk, A.P.; Macht, L.J.; Rodle, T.C.; Jos, H.F.F.; Larsen, P.K. |
| 2005 | Influence of the nucleation layer morphology and epilayer structure on the resistivity of GaN films grown on c-plane sapphire by MOCVD | Grzegorczyk, A.P.; Macht, L.J.; Hageman, P.R.; Weyher, J.L.; Larsen, P.K. |
| 2004 | The effect of HVPE reactor geometry on GaN growth rate - experiments versus simulations | Dam, C.E.C.; Grzegorczyk, A.P.; Hageman, P.R.; Dorsman, R.; Kleijn, C.R.; Larsen, P.K. |
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