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| Title: | Fabrication of Sub-10 nm Metallic Lines of Low Line-Width Roughness by Hydrogen Reduction of Patterned Metal-Organic Materials |
| Author(s): | Nedelcu, M.
Saifullah, M.S.M.
Hasko, D.G.
Jang, A.
Anderson, D.
Huck, W.T.S.
Jones, G.A.C.
Welland, M.E.
Kang, D.J.
Steiner, U. |
| Publication year: | 2010 |
| Document type: | Article / Letter to editor |
| Journal: | Advanced Functional Materials |
| ISSN: | 1616-301X |
| Volume: | vol. 20 |
| Issue: | iss. 14 |
| Start page: | p. 2317 |
| End page: | p. 2323 |
| Number of pages: | 7 p. |
| Subject: | Physical Organic Chemistry |
| Organization: | Physical Organic Chemistry |
| Appears in Collections: | Academic bibliography
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Please use this identifier to cite or link to this item:
http://hdl.handle.net/2066/83578
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